SEMI Grade5 For 14nm and further technology node
NAME | APPLICATION |
H2O2 | Widely used in the semiconductor front wet cleaning process, including the cleaning of particles, metal impurities and organic residues |
H2SO4 | Removing photoresist and other organic residues |
NH4OH | Removing water particle and cleaning polymer |
NH4F·HF | Etchant of silicon oxide used in wet etching process |
HNO3 | Applied in water recycling and cleaning process |
HCI | Applied in metal ion impurity removing process |
C4H13NO | Applied in water thinning process and also universal developer of photoresist |
All rights: Crystal Clear Electronic Material Co.,Ltd. 苏ICP备05007813号
Technical:EEEKEJI
Hotline:4000-300655
Address:168 Shanfeng Road, Wuzhong District, Suzhou
All rights:Crystal Clear Electronic Material Co.,Ltd.
Technical:EEEKEJI